Cov khoom muag
HII 100 yog ib qho tshwj xeeb H/He ion implanter. Nws yog lub hom phiaj- ua rau hydrogen thiab helium ion implantation txheej txheem, tshwj xeeb tshaj yog rau electrostatic- rhiab heev insulating khoom implantation thiab txheej-splitting technology. Txais batch implantation architecture, cov cuab yeej txhawb siab - zog thiab siab - koob tshuaj cog. Nws yog txawm peem rau nrog ob -sided plasma da dej muaj nuj nqi kom txo tau cov nqi tsub zuj zuj thiab electrostatic puas tsuaj ntawm wafers. Cov cuab yeej no ua haujlwm sib xyaw ua ke -kev tsim khoom semiconductor, SOI cov khoom nqa- tawm, kev hloov kho cov khoom siv thiab lwm yam R&D thiab pilot- cov cai tsim khoom rau 4-nti thiab 6-nti wafers.
Qhov zoo
1. Muab ob npaug rau-plasma da dej system: Ua kom muaj zog tiv thaiv hluav taws xob tiv thaiv kev puas tsuaj, tsim nyog rau kev cog qoob loo ntawm electrostatic-rhiab insulating substrates.
2. Siab-zog & siab- koob tshuaj batch implantation: Txhawb batch wafer ua nrog siab siab zog thiab muaj peev xwm loj, txhim kho throughput rau txheej- hloov thiab faib cov txheej txheem.
3. Optimized rau H/He dominant implantation: Beam-kab kab yog tuned rau hydrogen thiab helium ions; kuj tau sib xws nrog B, Ar thiab lwm yam auxiliary implant hom rau ntau yam txheej txheem xav tau.
4. Controllable txheej txheem kub: ruaj khov wafer kub tswj nyob rau hauv RT-200℃kom tau raws li thermal txwv ntawm cov ntaub ntawv tshwj xeeb.
Kev ruaj ntseg beam ruaj khov: txhim khu kev qha ion qhov chaw thiab nqaj thauj khoom tsim tau lav ntev -khiav kev ruaj ntseg rau cov khoom tshawb fawb thiab kev tsav tsheb- ntim ntau lawm.
Daim ntawv thov
Cov khoom nqa-tawm / txheej cais rau SOI thiab cov ntse zoo sib xws- txiav technologies
Implantation rau insulating thiab electrostatic{0}} cov ntaub ntawv rhiab heev
Compound- hloov khoom siv semiconductor
Kev tshawb fawb txog kev tshawb fawb, tshiab -cov ntaub ntawv kev txhim kho thiab kev tsim khoom tsim
Parameters
|
Yam khoom |
Specification |
|
Wafer Loj |
6 hli, 4 nti |
|
Zog Ntau Yam (Ib zaug - nqi) |
30-400 KV |
|
Implant Hom |
H, He, B, Ar |
|
Txheej Txheem Wafer Kub |
RT-200 degree |
FAQ
Q: Dab tsi yog qhov tseem ceeb ntawm HII 100 piv nrog cov hom phiaj dav dav?
A: Nws cov ntsiab lus tseem ceeb yog ob sab plasma da dej ua haujlwm, uas daws cov teeb meem electrostatic puas tsuaj rau insulating thiab them nqi wafers. Nws yog optimized rau siab koob tshuaj H / Nws batch implantation rau cov khoom splitting txheej txheem.
Q: Cov txheej txheem dab tsi yog HII 100 feem ntau siv rau?
A: Nws yog dav siv rau H / Nws induced txheej splitting (Smart Cut), insulating cov ntaub ntawv ion implantation, thiab cov khoom hloov kho ntawm compound semiconductors. Nws haum rau ob qho tib si lab scale tshawb fawb thiab me me batch pilot ntau lawm.
Q: Qhov ntau thiab tsawg wafer tuaj yeem HII 100 kov?
A: Txuj kev txhawb nqa rau 4 nti thiab 6 nti wafers. Cov neeg tuav cov qauv kev cai tuaj yeem txiav txim siab rau cov khoom me me tshwj xeeb thaum thov.
Q: Puas yog HII 100 implant ions uas tsis yog H thiab Nws?
A: Yog. Dhau li ntawm H thiab Nws, nws txhawb B thiab Ar rau cov txheej txheem implantation auxiliary.
Q: Lub sijhawm ua haujlwm kub yog dab tsi thaum cog?
A: Cov txheej txheem wafer kub nyob ntawm chav tsev kub txog li 200 degree, sib piv thermal rhiab substrate yuav tsum.
Q: HII 100 puas tuaj yeem ua haujlwm nrog lwm tus SEMICORE ZKX implanters?
A: Yog. Nws tuaj yeem koom tes nrog SiC nplooj siab implanters, ntau lub luag haujlwm customized implanters thiab qib ntau lawm CIP / CIC / CIE series platforms. Nws tuaj yeem ua tiav ua ntej kev tshawb fawb ntawm cov khoom noj tshwj xeeb ua ntej kev sim ntau lawm.
Q: Cov kev pab cuam tom qab muag muaj dab tsi?
A: Peb muab cov khoom seem, ntawm qhov chaw teeb tsa & commissioning, kev saib xyuas niaj hnub, thiab kev txhawb nqa rau cov txheej txheem tshwj xeeb daim ntawv qhia debugging.
Cim npe nrov: Tuam Tshoj H/he Ion implanter manufacturers, lwm tus neeg
