Cov khoom muag
LEII-100 yog qhov siab -kev ua haujlwm qis- zog siab- tam sim no ion implanter. Optimized rau qis-zog siab- cov txheej txheem doping rau kev tsim khoom semiconductor siab heev. Lub tshuab muaj lub zog dav dav nrog kev ua tau zoo hauv qhov qis- zog tswj. Nws nruj me ntsis ua tau raws li cov txheej txheem siab tshaj plaws nyob rau hauv cov nqe lus ntawm kev tswj lub zog, kev ua haujlwm zoo thiab kev tiv thaiv hlau tsis huv. Nruab nrog wafer thauj tau zoo heev thiab scanning subsystems, LEII -100 muab siab WPH (wafer ib teev) rau loj ntau lawm ntawm 8-nti thiab 12-nti wafers. Nws tau raug xa mus rau hauv kev lag luam loj hauv IC fabs, txhawb nqa cov txheej txheem tsim tawm mus txog 28 nm node.
Qhov zoo
Kev ua tau zoo heev tsawg-zog beam kev ua tau zoo: Ua kom zoo rau qis- lub zog ua haujlwm, cov kab hluav taws xob ruaj khov hauv qab ultra- tsis muaj zog. Lub zog- cuam tshuam txog kev kis kab mob yog tswj tau qis dua 0.05% kom ua tau raws li qhov xav tau ntawm cov node siab heev.
High throughput: Txais siab -kev ua tau zoo wafer kis tau tus mob thiab scanning system kom ua tiav WPH siab rau siab - ntim fab ntau lawm.
Cov txheej txheem puv - ntau yam kev pab them nqi: Txhawb ntau hom cog cog thiab lub qhov rais dav dav, npog cov zaub mov tseem ceeb doping rau cov laj thawj, nco thiab lub zog.
Superior particle & metal contamination control: nruj particle suppression and metal -contamination mitigation design to guarantee wafer yield.
Fab-kev ntseeg tau taw qhia: Tsim los rau kev tsim khoom loj tas mus li, xa cov kev ua haujlwm ruaj khov rau 24/7 fab kev ua haujlwm.
Daim ntawv thov
LEII-100 yog dav siv rau ion implantation nyob rau hauv mainstream semiconductor li:
LOGIC, DRAM, 3D NAND, NOR Flash
CMOS, MOSFET, IGBT, BCD
CIS, MEMS thiab lwm yam cuam tshuam nrog cov txheej txheem tsim khoom
Tsis muaj
|
Yam khoom |
Specification |
|
Zog Ntau |
200 eV-60/80 keV |
|
Wafer Loj |
12 nti, 8 nti |
|
Max Beam Tam sim no |
B⁺: 16 mA; Raws li: 25 mA; P ⁺: 25 mA |
|
Implant Hom |
B, P, As, F, C, Si, Ge, N, Ar, H, He |
|
Dose Range |
2 E13-1E17 ions / cm² |
|
Dose Uniformity |
Energy >3 txv:1< 1%; Energy < 3 keV: 1σ < 1% |
|
Dose Repeatability |
Energy >10 kV:1s< 0.7%; Energy < 10 keV: 1σ < 1.0% |
|
Hluav taws xob paug |
< 0.05% |
FAQ
Q: Qhov ntau thiab tsawg wafer thiab cov khoom tseem ceeb ntawm LEII 100 txhawb nqa?
A: Nws txhawb nqa 8 nti thiab 12 nti wafers. Nws yog tsim nyog rau cov txheej txheem ntau lawm mus rau 28 nm, muaj feem xyuam rau cov logic, nco thiab lub zog ntaus ntawv loj tsim.
Q: Dab tsi yog qhov tseem ceeb ntawm LEII 100 piv nrog rau lwm cov implanters siab tam sim no?
A: Nws qhov txiaj ntsig tseem ceeb yog nyob rau hauv kev ua haujlwm zoo ntawm lub zog qis. Nws tuav cov kab hluav taws xob siab tam sim no thiab tsis tshua muaj paug ntawm lub zog qis (qis mus txog 200 eV), ua ke nrog cov khoom siv siab dhau los ntawm kev txhim kho kev thauj mus los zoo rau kev siv tshuaj ntau ntau doping.
Q: Hom ion twg tuaj yeem cog LEII 100?
A: Kev txhawb nqa hom muaj xws li B, P, As, F, C, Si, Ge, N, Ar, H, Nws, npog feem ntau cov kev cai doping rau silicon raws li semiconductors.
Q: Yuav ua li cas yog cov hlau thiab particle paug paug?
A: Lub zog cuam tshuam txog kev sib kis yog tswj tau qis dua 0.05%. Kev tsim kho tshwj xeeb thiab kab kab thaiv kev tiv thaiv kom txo tau cov khoom tsim thiab cov hlau sib kis kom tau raws li cov kev xav tau siab tshaj fab yield.
Q: LEII 100 puas tuaj yeem ua haujlwm nrog lwm tus SEMICORE implanters hauv ib qho fab?
A: Yog. LEII 100 tuaj yeem siv ua ke nrog CIP series nruab nrab tam sim no implanters, CIC200 nruab nrab lub zog siab tam sim no implanters thiab CIE8000 siab zog implanters, los tsim kom tiav hauv tsev ion cog tshuaj rau fabs.
Q: Dab tsi ntawm kev muag khoom thiab kev pabcuam kev pabcuam tuaj yeem tau txais?
A: SEMICORE ZKX muab cov khoom seem, kev saib xyuas txhua xyoo, kev txav mus los hauv kev pabcuam thiab kev pabcuam kho dua tshiab. Nyob rau ntawm qhov chaw kev pab txhawb nqa thiab daim ntawv qhia tuning kev pab muaj rau cov kab ntau lawm debugging.
Cim npe nrov: Tuam Tshoj low-zog high-tam sim no ion implanter manufacturers, lwm tus neeg
