Cov khoom muag
UHB 100 yog lub siab -kev ua tau zoo siab- zog ion implanter. Nws yog tsim los rau kev sib sib zog nqus- cov txheej txheem doping rau kev tsim khoom semiconductor siab heev. Featuring high acceleration zog mus txog 8 MeV rau ib zaug -them ions, lub tshuab txais ib qho -wafer implantation architecture. Nws muab kev ruaj ntseg zoo, kev tswj xyuas qhov tseeb, kev cog lus zoo dua qub thiab rov ua dua tshiab, txhawb nqa cov txheej txheem dav dav rau logic, nco, duab thiab cov khoom siv hluav taws xob.
Qhov zoo
Ultra-siab beam zog muaj peev xwm: Ib zaug- them ion zog tshaj 1 MeV, lub zog siab tshaj plaws mus txog 8 MeV, txhawb kev sib sib zog nqus-zoo thiab retrograde- cov txheej txheem implantation zoo.
High-kev ua tau zoo ntev- lub neej ion qhov chaw: Optimized ion- qhov chaw tsim kom ruaj khov tso zis raws li MeV- theem acceleration tej yam kev mob thiab txo downtime rau qhov chaw tu.
Siab zog purity & beam kis tau tus mob efficiency: Advanced beam-kab optical tsim txhim kho beam kis tau tus mob efficiency thiab suppresses lub zog paug rau siab - zoo implantation profiles.
Cov txheej txheem zoo heev: Cov koob tshuaj zoo sib xws thiab rov ua tau zoo nyob thoob plaws cov koob tshuaj tag nrho, ua kom txaus siab rau cov kev xav tau nruj ntawm qib siab -node pawg ntau lawm.
Ib leeg-wafer ntau lawm- taw qhia kev tsim qauv: Ib zaug-wafer implantation tsim ua kom hloov tau yooj yim daim ntawv qhia hloov, haum rau sib xyaw- khoom loj- ntau lawm hauv fabs.
Daim ntawv thov
UHB 100 txhawb siab - zog sib sib zog nqus- hlws ris implantation rau mainstream semiconductor chips:
LOGIC, DRAM, 3D NAND, NOR Flash
CMOS, MOSFET, IGBT, BCD fais fab khoom siv
CIS, MEMS thiab lwm yam kev yees duab - hais txog cov khoom siv hluav taws xob semiconductor
Tsis muaj
|
Yam khoom |
Specification |
|
Zog Ntau |
20 keV-8 MeV |
|
Max Beam tam sim no |
B⁺: Ntau dua lossis sib npaug rau 1000 μA @ 1 MeV |
|
Dose Range |
1E11-5E15 ions / cm² |
|
Dose Uniformity (1σ) |
1E11-5E11 ions / cm²: Tsawg dua lossis sib npaug 1%; 5E11-5E15 ions / cm²: Tsawg dua lossis sib npaug 0.5% |
|
Dose Repeatability (1 σ) |
1E11-5E11 ions / cm²: Tsawg dua lossis sib npaug 1%; 5E11-5E15 ions / cm²: Tsawg dua lossis sib npaug 0.5% |
FAQ
Q: Dab tsi yog qhov tseem ceeb daim ntawv thov scenario rau UHB 100?
A: UHB 100 feem ntau yog siv rau siab zog sib sib zog nqus hleb doping xws li retrograde zoo thiab tob zoo implantation rau logic chips, cia chips thiab fais semiconductor li. Nws npog cov kauj ruam tseem ceeb siab zog implantation rau qib siab ntawm kev tsim khoom.
Q: Dab tsi yog qhov siab tshaj plaws acceleration zog ntawm UHB 100?
A: Lub zog siab tshaj plaws mus txog 8 MeV rau ib qho kev them nyiaj ions, thiab cov kab hluav taws xob ruaj khov tam sim no tuaj yeem ua tiav ntawm lub zog siab dua 1 MeV.
Q: Yuav ua li cas txog kev tswj cov koob tshuaj?
A: Rau ntau npaum li cas 1E11 5E11 ions / cm², 1σ uniformity thiab repeatability Tsawg dua lossis sib npaug li 1%; rau 5E11 5E15 ions / cm², 1σ uniformity thiab repeatability Tsawg dua los yog sib npaug rau 0.5%, uas ua tau raws li nruj me ntsis ntau lawm yuav tsum tau rau IC fabs.
Q: UHB 100 puas tuaj yeem ua haujlwm nrog lwm tus SEMICORE implanters hauv ib kab ntau lawm?
A: Yog. UHB 100 tuaj yeem ua ke nrog CIP series nruab nrab tam sim no implanters, CIC series siab tam sim no implanters los tsim ib qho kev daws teeb meem hauv tsev ion implants npog qis zog, nruab nrab lub zog thiab cov txheej txheem siab zog.
Q: Cov kev pabcuam twg tuaj yeem muab tau?
A: SEMICORE ZKX muab tag nrho cov khoom seem ntawm cov khoom siv, kev saib xyuas txhua xyoo, kev txav mus los hauv kev pabcuam, khoom siv kho dua tshiab, ntawm qhov chaw pabcuam kev pabcuam thiab cov txheej txheem kev pabcuam rau cov kab ntau lawm commissioning.
Q: Puas yog UHB 100 tsim nyog rau 28 nm loj ntau lawm?
A: Yog. UHB 100 tau raug txheeb xyuas rau cov txheej txheem ntau lawm mus rau 28 nm node rau domestic loj scale integrated circuits ntau lawm kab.
Cim npe nrov: Tuam Tshoj high-zog ion implanter manufacturers, lwm tus neeg
