Yam tsawg kawg nkaus feature
Yam tsawg kawg nkaus Critical Dimension (CD):
Qhov tsawg kawg nkaus qhov loj me, tseem hu ua ib nrab suab loj, yog ib qho tseem ceeb tshaj plaws rau kev ntsuas kev ua haujlwm ntawm cov tshuab lithography.
Ntawm lawv, yog qhov tsis tu ncua uas sib txawv hauv cov txheej txheem lithography sib txawv, qhov twg λ yog lub wavelength ntawm lub teeb pom kev zoo thiab NA yog tus lej aperture ntawm lithography tshuab kho qhov muag. Rau qhov tsis tu ncua, tam sim no ASML's DUV lithography tshuab hauv Netherlands tuaj yeem ua tiav qhov siab tshaj plaws ntawm 0.25, thaum EUV tseem nyob ib puag ncig 0.35. Qhov me dua qhov wavelength ntawm lub teeb pom kev zoo, qhov me me ntawm cov txheej txheem photolithography uas tuaj yeem ua tau. Rau cov lej aperture NA, qhov txwv siab tshaj ntawm tus nqi no feem ntau yog 1.0 rau cov phiaj xwm tsis ntub dej DUV thiab nyob ib puag ncig 1.35 rau wetting DUV schemes. Piv rau cov lithography uas tsis yog immersion lithography, immersion lithography tshuab siv cov kua ntxiv rau refraction thaum lub sij hawm lithography, feem ntau yog cov dej ntshiab nrog qhov ntsuas qhov ntsuas ntawm 1.33. Qhov no kuj yog vim li cas vim li cas immersion lithography tshuab muaj NA loj dua.
Engraving raug
Overlay raug: Kev sib dhos qhov tseeb ntawm daim npog ntsej muag thiab cov qauv wafer.
Lub ntsiab lus tseem ceeb yog hais txog kev sib raug zoo ntawm cov qauv ntawm ob txheej txheem photolithography. Yog tias qhov sib txawv ntawm qhov sib txawv loj dhau, nws yuav cuam tshuam ncaj qha rau cov khoom lag luam.
Kev kam rau siab
Exposure Latitude: Exposure latitude, tseem hu ua exposure margin, yog ib qho tseem ceeb ntawm cov txheej txheem qhov rais. Optical exposure systems muaj peev xwm tsim tau ib qho kev nthuav tawm lub zog uas ua tau raws li qhov tsim qauv tsim. Nws feem ntau yog txhais los ntawm kev xaiv lub zog ntawm qhov chaw nyob hauv ± 10% ntawm qhov hloov pauv hauv CD tus nqi kuaj pom los ntawm qhov tshwm sim raug. Yog hais tias txoj kab dav ntawm cov qauv raug hloov me ntsis thaum lub photoresist deviates los ntawm qhov pom kev pom koob tshuaj, nws qhia tau hais tias tus photoresist muaj qhov loj txaus kam rau ua. Qhov ntau dua qhov raug mob, qhov loj dua qhov kev loj hlob kam rau ua.
Kev kam rau ua kom pom tseeb thiab qhov pom qhov sib txawv ntawm cov duab zoo sib xws. Yog hais tias qhov loj me ntawm cov duab projected muaj cov duab tsis zoo sib xws, nws yuav ua rau muaj kev hloov pauv ntau dhau
