Photoresist yog ib qho kev sib xyaw ntawm cov polymers thiab qee qhov sib txuas, ntawm qhov tseem ceeb tshaj plaws yog photo acid generator (PAG). Thaum photons ntaus PAG, cov kua qaub yog tsim tawm uas cuam tshuam nrog cov polymer, decomposing nws thiab ua rau nws yaj los ntawm tus tsim tawm.
Photolithography photoresist feem ntau muab faib ua ob hom: zoo photoresist thiab tsis zoo photoresist.
Qhov zoo ntawm photoresist: Cov feem nthuav tawm yog soluble nyob rau hauv cov kev daws teeb meem, thaum lub unexposed feem yog insoluble nyob rau hauv tus tsim tawm tov. Tom qab kev txhim kho, tus qauv photoresist seem ntawm lub substrate yog tib yam li lub hom phiaj qauv ntawm daim npog ntsej muag.
Tsis zoo photoresist: Cov feem nthuav tawm yog insoluble nyob rau hauv tus tsim tawm tov, thaum lub unexposed feem yog soluble nyob rau hauv tus tsim tawm tov. Cov qauv photoresist tseem tshuav ntawm lub substrate tom qab kev loj hlob yog ntxiv rau lub hom phiaj qauv ntawm daim npog ntsej muag.
Yog li ntawd, rau qhov zoo photoresist, etching lub substrate yam tsis muaj kev tiv thaiv photoresist tom qab photolithography ua tiav, thiab thaum kawg ntxuav tawm cov photoresist ntxiv, ua tiav ib qho - cov txheej txheem kev tsim kho ntawm cov khoom siv semiconductor ntawm lub substrate.
