Raws li lawv cov kev siv sib txawv, lawv tuaj yeem muab faib ua cov khoom siv chips, ntim khoom, thiab kev tsim LED.
Raws li qhov sib txawv ntawm cov teeb pom kev zoo, lawv tuaj yeem muab faib ua ultraviolet light sources (UV), tob ultraviolet light sources (DUV), thiab ultraviolet light sources (EUV). Lub wavelength ntawm lub teeb ci cuam tshuam rau cov txheej txheem ntawm lub tshuab lithography.
Lub tshuab ultraviolet lithography huab cua tau siv txoj hauv kev tshiab los muab cov teeb pom kev luv luv dua. Txoj kev tseem ceeb tam sim no siv yog irradiate ib qho excimer laser mus rau lub tshuab hluav taws xob tin droplet, zoo siab 13.5nm photons ua lub teeb ci rau lub tshuab lithography. ASML tam sim no tsuas yog cov chaw tsim khoom hauv ntiaj teb uas muaj peev xwm tsim thiab tsim cov khoom siv EUV lithography.
Raws li kev khiav hauj lwm sib txawv, nws tuaj yeem muab faib ua kev sib cuag lithography, sau ncaj qha lithography, thiab projection lithography.
hu rau luam ntawv
Hu rau Printing
Daim npog ntsej muag yog nyob rau hauv kev sib cuag ncaj qha nrog cov txheej txheem photoresist. Qhov kev daws teeb meem ntawm cov qauv raug muab piv rau cov qauv ntawm lub npog ntsej muag, thiab cov cuab yeej siv tau yooj yim. Raws li txoj kev thov quab yuam, kev sib cuag tuaj yeem muab faib ua kev sib cuag mos, kev sib cuag nyuaj, thiab lub tshuab nqus tsev.
1 ib a. Kev sib cuag mos yog hais txog cov txheej txheem ntawm kev txuas lub substrate rau hauv lub tais (zoo ib yam li cov txheej txheem tso rau hauv substrate ntawm cov nplaum nplaum), nrog lub npog ntsej muag npog lub substrate;
1b ib. Kev sib cuag nyuaj yog cov txheej txheem ntawm kev thawb lub substrate upwards nyob rau hauv lub siab (nitrogen) kom sib cuag nrog lub npog ncauj phaj;
1c ib. Lub tshuab nqus tsev sib cuag yog cov txheej txheem ntawm kev rho tawm huab cua ntawm daim npog ntsej muag thiab cov substrate los xyuas kom meej qhov adhesion zoo dua.
Nta: photoresist contamination daim npog qhov ncauj board; Daim npog ntsej muag muaj kev puas tsuaj thiab muaj lub neej luv luv (tsuas yog 5 txog 25 siv); Ib qho yooj yim mus khaws cov tsis xws luag.
Qhov sib thooj lithography
Kev luam ntawv sib thooj
Muaj qhov sib txawv me me (kwv yees li 2.5-25 μ m) ntawm daim npog ntsej muag thiab cov txheej hauv qab ntawm photoresist substrate. Nws tuaj yeem zam kev puas tsuaj rau daim npog ntsej muag los ntawm kev sib cuag ncaj qha nrog photoresist, ua rau lub ntsej muag thiab photoresist substrate ruaj rau siv; Lub npog ntsej muag muaj lub neej ntev (uas tuaj yeem nce ntau dua 10 npaug) thiab tsawg dua cov duab tsis xws luag. Proximity lithography yog siv dav hauv cov txheej txheem photolithography niaj hnub.
