Cov khoom muag

VPD system workflows lov rau hauv peb kauj ruam tseem ceeb: Ua ntej, HF vapor lov cov oxide txheej ntawm wafer nto; tom ntej no, nws tso cov hlau uas nyob hauv; Thaum kawg, cov kua dej muaj tseeb sau cov kab mob no rau hauv - tsom xam qhov tob.

Ua raws li SEMI cov qauv, lub kaw lus ua haujlwm seamlessly nrog 8-inch thiab 12-nti fabs (6-nti wafers tau txais kev txhawb los ntawm cov tais xaiv). Thaum ua ke nrog ICP-MS lossis TXRF, nws thawb rhiab heev los ntawm tag nrho 100x.

Txawm hais tias rau siab -cov kab ntau lawm los yog R&D labs, nws muab kev ua haujlwm zoo ib yam, ruaj khov-txawm tias nyob hauv qhov chaw tsim khoom semiconductor feem ntau nyuaj.

Qhov zoo

1. Ultra- tsis tshua pom kev txwv: Txhim kho cov kab hlau kom ua tiav 10⁵-10⁸ atoms/cm² rhiab heev nrog ICP-MS/MS, npog tag nrho cov ntsiab lus ntawm Li rau U.

2. Kev sib tw dav: Ib txwm txhawb nqa 8/12-nti wafers; haum cov qauv wafers, tuab oxides, thiab cov ntaub ntawv tshiab rau ntau yam xwm txheej.

3. Kev ua haujlwm siab: Radial scan ua tiav tag nrho -wafer ua haujlwm tsawg dua lossis sib npaug li 60s; SECS-GEM kev txhawb nqa ua kom muaj kev sib koom ua ke ntawm kev siv fais fab.

4. Txhim khu kev khaws cia: Cov qauv yooj yim (tag nrho-wafer/zonal/edge) nrog cov hlau zoo rov qab thiab muaj qhov paug paug tsawg.

Daim ntawv thov

1. Wafer pawg ntau lawm QC: Khaws cov tabs ntawm 8/12-inch logic, nco, thiab lub zog wafers-sniffing tawm impurities uas tuaj yeem derail kev ua tau zoo ntawm cov cuab yeej hauv kev tsim khoom tseem ceeb.

2. Wafer rov tsim dua tshiab: Tshawb xyuas cov kab mob sib kis ntawm cov wafers rov ua dua kom paub meej tias rov siv tau dua, pab txo cov nqi tsim khoom.

3. Advanced R&D: Quantifies dopants thiab impurities hauv 2D cov ntaub ntawv thiab cov yeeb yaj kiab tshiab, ua kom yooj yim rau kev nplua - kho cov txheej txheem tsis ua kom tau txais txiaj ntsig zoo dua.

4. wafer- qib ntim: Tshawb xyuas cov khoom ntim wafer thiab kev sib txuas sib txuas los tiv thaiv kev xeb lossis hluav taws xob ua haujlwm tsis zoo hauv kab.

Tsis muaj

Qeb	VPD system
Wafer Compatibility	8-nti, 12-nti (haiv neeg); 6-nti (yeem, ntawm cov tais tshwj xeeb)
Kev kuaj pom txwv (nrog ICP-MS/MS)	10⁵-10⁸ atoms / cm²; npog cov ntsiab lus 7Li rau 238U
Txheej Txheem Ua Haujlwm	Vapor theem decomposition → Precision droplet scanning → Contaminant collection
Tag nrho - Lub Sijhawm Ua Haujlwm Wafer	Tsawg dua lossis sib npaug li 60 vib nas this (radial ceev-scanning nozzle)
Qauv qauv	Puv-wafer, zonal, annular; txhawb nqa ntug / bevel cheeb tsam sau
Decomposition nruab nrab	Siab -purity HF vapor (tswj siab thiab ntws tus nqi)
Compatible Analysis Tools	ICP-MS, ICP-MS/MS, TXRF
Automation raws tu qauv	Txhawb SECS-GEM; Integable rau hauv automated semiconductor ntau lawm kab
Kev ua raws li kev lag luam	Ua raws li cov qauv SEMI
Siv tau hom Wafer	Liab qab wafers, qauv wafers, tuab oxide txheej wafers, cov khoom tshiab wafers