Ion Beam Etching Khoom

Ion Beam Etching Khoom

Ion Beam Etching (IBE) cov cav tov yog siab -cov cuab yeej ua haujlwm raug tsim nyob ib puag ncig lub cev ion beam etching tech. Lub tswv yim tseem ceeb? Cov khoom tawg yooj yim nrog siab - lub zog ion beams kom tshem tawm cov atoms - zoo meej rau kev ua tsis zoo ntawm - kev puas tsuaj ntawm cov tawv nqaij - rau - etch nkig cov ntaub ntawv (xws li hlau thiab ceramics) thiab rhiab quantum nti cov ntaub ntawv.
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Hauj lwm lawm

Cov khoom muag

 

Ion Beam Etching (IBE) cov cav tov yog siab -cov cuab yeej ua haujlwm raug tsim nyob ib puag ncig lub cev ion beam etching tech. Lub tswv yim tseem ceeb? Cov khoom tawg yooj yim nrog siab - lub zog ion beams kom tshem tawm cov atoms - zoo meej rau kev ua tsis zoo ntawm - kev puas tsuaj ntawm cov tawv nqaij - rau - etch cov ntaub ntawv nkig (xws li hlau thiab ceramics) thiab cov ntaub ntawv quantum nti.


Lawv tuaj nrog dual -mode worktable: ib zaug -piece ib qho nrog lub kaum sab xis hloov ntawm -90℃mus rau 90 degree, ntxiv rau ntau yam -thooj ncig rotating hom. Txawm hais tias koj tab tom ua me me - batch lab tshawb fawb lossis ntau lawm, nws yuav ua kom haum rau koj cov kev xav tau. Kuj tseem muaj cov dej txias / helium rov qab txias system kom wafers los ntawm thermal puas-yog li precision li zoo li quantum chips nyob ruaj khov tom qab ua tiav.


Nyob rau sab saum toj ntawm qhov ntawd, ion beam zog kho tau zoo ntawm 0 txog 1000 eV. Ua ke nrog etching uniformity tsawg dua los yog sib npaug rau ± 3% (rau 8-inch substrates), thiab koj tuaj yeem ntsia tau meej meej tswj qhov tob thiab cov qauv raug. Nws yog cov txheej txheem ua haujlwm tseem ceeb rau R & D ntawm cov khoom siv hluav taws xob siab tshaj (silicon carbide, 2D cov ntaub ntawv), high-precision optoelectronic device manufacturing, thiab quantum nti tsim.

 

Daim ntawv thov

 

1. Hard-rau- cov ntaub ntawv etch: superconducting hlau, ceramics (aerospace, siab-cov cuab yeej kawg)

2. Quantum chips: Tsawg-kev puas tsuaj etching ntawm qubits/quantum dots

 

3. Advanced semiconductors: SiC, GaN, 2D cov ntaub ntawv (R&D pov thawj)

4. Optoelectronics: Optical kev sib txuas lus (5G / 6G tshaj)

5. MEMS: Siab- yam- qauv piv (automotive, aerospace)

 

Qhov zoo

 

1. Tsawg-kev puas tsuaj & siab-precision: Lub cev etching, atomic tswj (quantum chips)
2. Cov khoom siv tawv tawv- tus phooj ywg: Superconducting hlau, ceramics, SiC (tsis muaj tweaks)
3. Cov rooj ua haujlwm yooj yim: Dual- hom (-90℃~ 90℃/ kev sib hloov) - R & D / ntau lawm
4. Kev tswj xyuas thermal: Dej / helium txias (tsis muaj thermal puas)
5. Tunable & zoo ib yam: 0-1000 eV + Tsawg dua los yog sib npaug rau ± 3% uniformity (steady batches)

 

Tsis muaj

 

Yam khoom

Cov cim qhia tshwj xeeb

Siv tau Substrate Size

Tsawg dua lossis sib npaug li 8 nti (8 nti thiab hauv qab); ib co configurations txhawb
substrates Tsawg dua los yog sib npaug li 6 nti

lon Beam Zog

0-1000 eV, txhawb kev hloov kho tas li (0-1000 eV,
tsis tu ncua adjustable)

lon Beam Current

Tsawg dua lossis sib npaug rau ± 1000 mA (rau RF ion qhov chaw); Tsawg dua lossis sib npaug rau ± 200 mA (rau Kaufman
ion qhov chaw)

Etching Uniformity

Tsawg dua lossis sib npaug ± 3% (raws li 8-nti substrate); Tsawg dua lossis sib npaug ± 5% (raws li 6-
inch substrate), txoj kev suav: (Tus nqi siab tshaj -
Yam tsawg kawg nkaus tus nqi)/(2xAverage tus nqi)

Substrate Theem Txias Txoj Kev

Dej txias / Helium rov qab txias

Worktable Hom

Dual -mode (Ib leeg- thooj hom: lub kaum sab xis adjustable ntawm-90 degree
rau 90 degree; Multi- thooj hom: ncig rotation)

Positioning Function

Txhawb Notch-point positioning

Cov ntaub ntawv siv tau

Hlau (superconducting Nb, Al, thiab lwm yam), ceramics, silicon
carbide, silicon, ob- cov khoom siv (MoS2, thiab lwm yam),
Cov khoom siv semiconductors

 

FAQ

 

Dab tsi yog qhov max substrate loj no IBE tuav?

Txog li 8 ntiv tes- qee qhov kev teeb tsa kuj ua haujlwm nrog substrates txog 6 ntiv tes.

Yuav ua li cas adjustable ion beam zog?

0-1000 eV, nrog kev txhawb nqa txuas ntxiv.

Muaj pes tsawg worktable hom muaj?

Ob hom: ib zaug - thooj (lub kaum sab xis kho -90℃rau 90 degree) thiab ntau daim (lub voj voog tig).

Lub substrate theem txias li cas?

Dej txias / helium rov qab txias- khaws cov substrate kom zoo los ntawm thermal puas thaum lub sij hawm etching.

Nws puas tuaj yeem ua cov khoom siv superconducting (xws li Nb, Al)?

Yep-tseem tuav cov khoom siv ceramics, SiC, 2D cov ntaub ntawv (MoS₂), thiab cov khoom siv semiconductors.

Dab tsi yog cov kab hluav taws xob tam sim no rau qhov sib txawv ion?

RF ion qhov chaw: Tsawg dua lossis sib npaug rau ± 1000 mA; Kaufman ion qhov chaw: Tsawg dua lossis sib npaug rau ± 200 mA.

Dab tsi yog etching uniformity?

Tsawg dua lossis sib npaug li ± 3% rau 8-inch substrates, Tsawg dua lossis sib npaug ± 5% rau 6-nti (xws li (Max - Min) / (2 × Nruab Nrab)).

Nws puas txhawb nqa qhov chaw substrate?

Tseeb -los nrog Notch- taw tes rau qhov chaw xauv hauv kev ua haujlwm raug.

Puas muaj kev hloov kho tsim rau quantum nti ua?

Tsawg-kev puas tsuaj lub cev etching ntxiv rau dej / helium txias- txiav thermal puas thiab khaws cov khoom siv, zoo meej rau cov qauv quantum nti.

Nws puas tuaj yeem hloov pauv ntawm me me -batch R&D thiab ntau lawm?

kiag li -dual- hom worktable haum rau ob qho tib si: ib zaug -piece rau me me-batch multi-angle tests, multi-piece rau loj ntau lawm.

 

Cim npe nrov: Tuam Tshoj ion beam etching khoom manufacturers, lwm tus neeg

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